The relative humidity of cell phone jammer is 35-85%
2.1.3 magnetron sputtering magnetron sputtering [14,24-26], also known as plasma plating, is a high-speed low substrate temperature of film technology, the main metal target using high-energy ion impact energy exchange, to splash out from the target surface of the target atoms or molecules deposited onto the textile substrate, the substrate to form a shield of metal film. The technology is simple and no sewage treatment, metal The fabric has good mechanical properties and heat resistance, fiber and strong integration between the metal layers, but the feel and resistance to washing performance is poor now more common target magnetron sputtering magnetron sputtering, magnetron scanning, unbalanced magnetron sputtering and pulsed magnetron sputtering.The relative humidity of cell phone jammer is 35-85%. Chenwen Xing et al [24] using DC magnetron sputtering plating process, found the greater the sputtering power, the greater the deposition rate, particle size distribution more uniform film, sputtering pressure of 0.9 Pa or so suitable, coating and substrate with a solid, more than 70 dB shielding effectiveness achieved. Hong Jian Han [27] using magnetron sputtering on a PET non-woven cloth of silver nano-scale thin-film deposition, due to quantum size effect nano-silver particles of electronic energy splitting to form new absorbing channel, and the silver particles near the surface layer of atoms is less dense, resulting in enhanced absorption, magnetic enhancement [28], when the silver film thickness of 100 nm , the fabric 30 kHz ~ 1.5 Guo and so the use of AgNO3 alternative to traditional expensive PaCl2 as targeted reminders [9] agent for copper fabric preparation. The static testing of positions of mobile phone jammer should be done. The results show, AgNO3 is a good PaCl2 alternatives, and preparation of the fabric surface metal copper thickness of about 37.13 nm, the frequency of electromagnetic radiation in 2 ~ 18 GHz, the shielding effect of up to 45 ~ 55 dB. fabric of electroless nickel [10-13] showed that the majority of its preparation method using electroless nickel-phosphorus alloy , which received more alkaline electroless nickel phosphorus plating, while the more acidic bath to obtain high-phosphorus coating [5], the shielding effect of the fabric fabric with copper compared to lower shielding,
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